Title
|
|
|
|
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering
| |
Author
|
|
|
|
| |
Abstract
|
|
|
|
In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A series of coatings was produced with a stoichiometry of the film ranging from MgO, over MgxAlyOz to Al2O3. The surface energy, crystallinity, hardness, refractive index, and surface roughness were investigated. A relationship between all properties studied and the Mg content of the samples was found. A critical compositional region for the Mg-Al-O system where all properties exhibit a change was noticed. |
| |
Language
|
|
|
|
English
| |
Source (journal)
|
|
|
|
Plasma processes and polymers. - Weinheim
| |
Publication
|
|
|
|
Weinheim
:
2009
| |
ISSN
|
|
|
|
1612-8850
| |
Volume/pages
|
|
|
|
6
:S:1
(2009)
, p. S751-S754
| |
ISI
|
|
|
|
000272302900144
| |
Full text (Publisher's DOI)
|
|
|
|
| |
|