Publication
Title
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering
Author
Abstract
In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A series of coatings was produced with a stoichiometry of the film ranging from MgO, over MgxAlyOz to Al2O3. The surface energy, crystallinity, hardness, refractive index, and surface roughness were investigated. A relationship between all properties studied and the Mg content of the samples was found. A critical compositional region for the Mg-Al-O system where all properties exhibit a change was noticed.
Language
English
Source (journal)
Plasma processes and polymers. - Weinheim
Publication
Weinheim : 2009
ISSN
1612-8850
DOI
10.1002/PPAP.200931809
Volume/pages
6 :S:1 (2009) , p. S751-S754
ISI
000272302900144
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identifier
Creation 08.12.2009
Last edited 25.05.2022
To cite this reference