Publication
Title
Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers
Author
Abstract
A 2d3v Particle-in-cell/Monte Carlo collisions (PIC/MCC) model was constructed for an Ar/N2 reactive gas mixture in a magnetron discharge. A titanium target was used, in order to study the sputter deposition of a TiNx thin film. Cathode currents and voltages were calculated self-consistently and compared with experiments. Also, ion fluxes to the cathode were calculated, which cause sputtering of the target. The sputtered atom fluxes from the target, and to the substrate were calculated, in order to visualize the deposition of the TiNx film.
Language
English
Source (journal)
Plasma processes and polymers. - Weinheim
Publication
Weinheim : 2009
ISSN
1612-8850
Volume/pages
6:S:1(2009), p. S784-S788
ISI
000272302900149
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
[E?say:metaLocaldata.cgzprojectinf]
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 08.12.2009
Last edited 02.11.2017
To cite this reference