Title
Plasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubesPlasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubes
Author
Faculty/Department
Faculty of Sciences. Chemistry
Research group
Plasma, laser ablation and surface modeling - Antwerp (PLASMANT)
Publication type
article
Publication
Bristol,
Subject
Chemistry
Source (journal)
Journal of physics : conference series. - Bristol
Volume/pages
275(2011):1, p. 012021,1-012021,9
ISSN
1742-6588
1742-6596
Carrier
E
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
A hybrid model, called the hybrid plasma equipment model (HPEM), is used to describe the plasma chemistry in an inductively coupled plasma, operating in a gas mixture of C2H2 with either H2 or NH3, as typically used for carbon nanotube (CNT) growth. Two-dimensional profiles of power density, electron temperature and density, gas temperature, and densities of some plasma species are plotted and analyzed. Besides, the fluxes of the various plasma species towards the substrate (where the CNTs can be grown), as well as the decomposition rates of the feedstock gases (C2H2, NH3 and H2), are calculated as a function of the C2H2 fraction in both gas mixtures.
Full text (open access)
https://repository.uantwerpen.be/docman/irua/bba7de/8e5c74e2.pdf
Handle