Plasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubesPlasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubes
Faculty of Sciences. Chemistry
Plasma, laser ablation and surface modeling - Antwerp (PLASMANT)
Journal of physics : conference series. - Bristol
275(2011):1, p. 012021,1-012021,9
University of Antwerp
A hybrid model, called the hybrid plasma equipment model (HPEM), is used to describe the plasma chemistry in an inductively coupled plasma, operating in a gas mixture of C2H2 with either H2 or NH3, as typically used for carbon nanotube (CNT) growth. Two-dimensional profiles of power density, electron temperature and density, gas temperature, and densities of some plasma species are plotted and analyzed. Besides, the fluxes of the various plasma species towards the substrate (where the CNTs can be grown), as well as the decomposition rates of the feedstock gases (C2H2, NH3 and H2), are calculated as a function of the C2H2 fraction in both gas mixtures.