Publication
Title
Modeling inductively coupled plasmas used for silicon etching : effects of chamber wall coating
Author
Abstract
Language
English
Source (journal)
Plasma sources science and technology / Institute of Physics [Londen] - Bristol, 1992, currens
Publication
Bristol : Institute of Physics, 2011
ISSN
0963-0252
Volume/pages
20:4(2011), p. 045012,1-045012,19
Article Reference
045012
ISI
000295829800014
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 05.09.2011
Last edited 26.05.2018
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