Publication
Title
Mechanisms for the trimethylaluminum reaction in aluminum oxide atomic layer deposition on sulfur passivated germanium
Author
Abstract
Language
English
Source (journal)
The journal of physical chemistry : C : nanomaterials and interfaces. - Washington, D.C., 2007, currens
Publication
Washington, D.C. : 2011
ISSN
1932-7447 [print]
1932-7455 [online]
Volume/pages
115:35(2011), p. 17523-17532
ISI
000294386000037
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 13.10.2011
Last edited 03.07.2018
To cite this reference