Publication
Title
Numerical study of the plasma chemistry in inductively coupled and plasmas used for deep silicon etching applications
Author
Abstract
Language
English
Source (journal)
Journal of physics: D: applied physics. - London
Publication
London : 2011
ISSN
0022-3727
Volume/pages
44:43(2011), p. 435202,1-435202,15
Article Reference
435202
ISI
000296591100004
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 17.10.2011
Last edited 23.01.2018
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