Publication
Title
The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures
Author
Abstract
Language
English
Source (journal)
Materials science in semiconductor processing. - Oxford
Publication
Oxford : 2001
ISSN
1369-8001
Volume/pages
4:1/3(2001), p. 117-119
ISI
000167727200028
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 24.02.2012
Last edited 12.02.2018
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