Publication
Title
Plasma-enhanced chemical vapor deposition and structural characterization of amorphous chalcogenide films
Author
Abstract
Language
English
Source (journal)
Semiconductors. - New York
Publication
New York : 1998
ISSN
1063-7826
Volume/pages
32:8(1998), p. 855-860
ISI
000076068700011
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
Faculty/Department
Research group
Project info
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 29.02.2012
Last edited 23.01.2018
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