Publication
Title
Stress analysis with convergent beam electron diffraction around NMOS transistors
Author
Language
English
Source (book)
5th Multinational Congress on Electron Microscopy, Sept. 20-25, 2001, Lecc, Italy
Publication
Princeton, N.J. : Princeton University Press, 2001
ISBN
1-58949-003-7
Volume/pages
(2001), p. 359-360
ISI
000183071700141
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 01.03.2012
Last edited 11.08.2017
To cite this reference