Publication
Title
Accurate infrared absorption measurement of interstitial and precipitated oxygen in silicon wafers
Author
Abstract
Language
English
Source (journal)
Microelectronic engineering. - Amsterdam
Publication
Amsterdam : 1999
ISSN
0167-9317
Volume/pages
45:2-3(1999), p. 277-282
ISI
000081748600023
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 01.03.2012
Last edited 11.08.2018
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