Title |
|
|
|
Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates
| |
Author |
|
|
|
| |
Abstract |
|
|
| | |
Language |
|
|
|
English
| |
Source (journal) |
|
|
|
Journal of vacuum science and technology: A: vacuum surfaces and films. - New York, N.Y., 1983, currens | |
Publication |
|
|
|
New York, N.Y. : 2012
| |
ISSN |
|
|
|
0734-2101
| |
Volume/pages |
|
|
|
30:1(2012), p. 01A127,1-01A127,10
| |
Article Reference |
|
|
|
01A127
| |
ISI |
|
|
|
000298992800027
| |
Medium |
|
|
|
E-only publicatie
| |
Full text (Publisher's DOI) |
|
|
| | |
|