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Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates
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| Abstract |
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English
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| Source (journal) |
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Journal of vacuum science and technology: A: vacuum surfaces and films. - New York, N.Y., 1983, currens | |
| Publication |
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New York, N.Y. : 2012
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| ISSN |
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0734-2101
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| Volume/pages |
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30:1(2012), p. 01A127,1-01A127,10
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| Article Reference |
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01A127
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| ISI |
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000298992800027
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E-only publicatie
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| Full text (Publisher's DOI) |
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