Publication
Title
Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates
Author
Abstract
Language
English
Source (journal)
Journal of vacuum science and technology: A: vacuum surfaces and films. - New York, N.Y., 1983, currens
Publication
New York, N.Y. : 2012
ISSN
0734-2101
Volume/pages
30:1(2012), p. 01A127,1-01A127,10
Article Reference
01A127
ISI
000298992800027
Medium
E-only publicatie
Full text (Publisher's DOI)
UAntwerpen
Faculty/Department
Research group
Publication type
Subject
Affiliation
Publications with a UAntwerp address
External links
Web of Science
Record
Identification
Creation 05.03.2012
Last edited 20.01.2018
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