Title
The effect of <tex>$F_{2}$</tex> attachment by low-energy electrons on the electron behaviour in an <tex>$Ar/CF_{4}$</tex> inductively coupled plasma
Author
Faculty/Department
Faculty of Sciences. Chemistry
Publication type
article
Publication
Bristol :Institute of Physics ,
Subject
Physics
Chemistry
Source (journal)
Plasma sources science and technology / Institute of Physics. - Bristol, 1992, currens
Volume/pages
21(2012) :2 , p. 025008,1-025008,13
ISSN
0963-0252
Article Reference
025008
Carrier
E-only publicatie
Target language
English (eng)
Full text (Publishers DOI)
Affiliation
University of Antwerp
Abstract
The electron behaviour in an Ar/CF4 inductively coupled plasma is investigated by a Langmuir probe and a hybrid model. The simulated and measured results include electron density, temperature and electron energy distribution function for different values of Ar/CF4 ratio, coil power and gas pressure. The hybrid plasma equipment model simulations show qualitative agreement with experiment. The effect of F2 electron attachment on the electron behaviour is explored by comparing two sets of data based on different F atom boundary conditions. It is demonstrated that electron attachment at F2 molecules is responsible for the depletion of low-energy electrons, causing a density decrease as well as a temperature increase when CF4 is added to an Ar plasma.
E-info
https://repository.uantwerpen.be/docman/iruaauth/2b3cf6/a5dede19c1b.pdf
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