Publication
Title
The effect of $F_{2}$ attachment by low-energy electrons on the electron behaviour in an $Ar/CF_{4}$ inductively coupled plasma
Author
Abstract
 The electron behaviour in an Ar/CF4 inductively coupled plasma is investigated by a Langmuir probe and a hybrid model. The simulated and measured results include electron density, temperature and electron energy distribution function for different values of Ar/CF4 ratio, coil power and gas pressure. The hybrid plasma equipment model simulations show qualitative agreement with experiment. The effect of F2 electron attachment on the electron behaviour is explored by comparing two sets of data based on different F atom boundary conditions. It is demonstrated that electron attachment at F2 molecules is responsible for the depletion of low-energy electrons, causing a density decrease as well as a temperature increase when CF4 is added to an Ar plasma.
Language
English
Source (journal)
Plasma sources science and technology / Institute of Physics [Londen] - Bristol, 1992, currens
Plasma sources science and technology / Institute of Physics [Londen] - Bristol, 1992, currens
Publication
Bristol : Institute of Physics , 2012
ISSN
0963-0252
Volume/pages
21 :2 (2012) , p. 025008,1-025008,13
Article Reference
025008
ISI
000302779400022
Medium
E-only publicatie
Full text (Publisher's DOI)
Full text (publisher's version - intranet only)
UAntwerpen
 Faculty/Department Research group Project info Publication type Subject Affiliation Publications with a UAntwerp address